• DocumentCode
    2335597
  • Title

    Characteristics of diamondlike carbon thin films produced by DC hollow cathode (DCHC) glow discharge in Ar/CH/sub 4/ plasmas

  • Author

    Seto ; Parent, J. ; Chang, Joseph S. ; Berezin

  • Author_Institution
    Dept. of Eng. Phys., McMaster Univ., Hamilton, Ont., Canada
  • fYear
    1989
  • fDate
    0-0 1989
  • Firstpage
    114
  • Abstract
    Summary Form only given, as follows. Diamondlike carbon thin films were produced by a plasma-enhanced chemical vapor deposition in a pinhole-type, hollow-cathode, DC glow discharge. The operating parameters were as follows: gas pressure from 0.01 to 10.0 mbar, discharge power from 0.1 to 20.0 W (with a discharge tube cross-sectional area of 3.14 cm/sup 2/), and concentration of methane in argon of up to 3% (atomic). Two discharge modes were observed: normal glow discharge and cathode glow discharge. The thin films produced under each discharge mode were studied and compared. X-ray diffraction measurements indicated that the films were composed of amorphous carbon, graphite, diamond, and a small amount of hydrogenated amorphous carbon. Infrared absorption showed the presence of C-H (sp/sup 3/) bonds and diamond in the films. The optical bandgap of the films is a nonlinear function of the film thickness, and its value ranges from 1.4 to 2.0 eV. Although the cathode was made of aluminum and titanium, Auger spectra showed no presence of either Al or Ti; argon is also absent from the films produced.<>
  • Keywords
    Auger effect; X-ray diffraction examination of materials; argon; carbon; diamond; energy gap; glow discharges; infrared spectra of inorganic solids; optical constants; organic compounds; plasma CVD; plasma CVD coatings; thin films; 0.01 to 10.0 mbar; 0.1 to 20.0 W; 1.4 to 2.0 eV; Al; Ar; Auger spectra; C; DC hollow cathode; Ti; X-ray diffraction measurements; amorphous; cathode; cross-sectional area; diamondlike; discharge modes; discharge power; gas pressure; glow discharge; graphite; infrared absorption; methane; nonlinear function; optical bandgap; pinhole-type; plasma-enhanced chemical vapor deposition; thin films; Argon; Carbon; Coatings; Diamond; Diffraction; Glow discharges; Infrared spectroscopy; Organic compounds; Plasma CVD; Thin films; X-rays;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
  • Conference_Location
    Buffalo, NY, USA
  • Type

    conf

  • DOI
    10.1109/PLASMA.1989.166164
  • Filename
    166164