DocumentCode
2335597
Title
Characteristics of diamondlike carbon thin films produced by DC hollow cathode (DCHC) glow discharge in Ar/CH/sub 4/ plasmas
Author
Seto ; Parent, J. ; Chang, Joseph S. ; Berezin
Author_Institution
Dept. of Eng. Phys., McMaster Univ., Hamilton, Ont., Canada
fYear
1989
fDate
0-0 1989
Firstpage
114
Abstract
Summary Form only given, as follows. Diamondlike carbon thin films were produced by a plasma-enhanced chemical vapor deposition in a pinhole-type, hollow-cathode, DC glow discharge. The operating parameters were as follows: gas pressure from 0.01 to 10.0 mbar, discharge power from 0.1 to 20.0 W (with a discharge tube cross-sectional area of 3.14 cm/sup 2/), and concentration of methane in argon of up to 3% (atomic). Two discharge modes were observed: normal glow discharge and cathode glow discharge. The thin films produced under each discharge mode were studied and compared. X-ray diffraction measurements indicated that the films were composed of amorphous carbon, graphite, diamond, and a small amount of hydrogenated amorphous carbon. Infrared absorption showed the presence of C-H (sp/sup 3/) bonds and diamond in the films. The optical bandgap of the films is a nonlinear function of the film thickness, and its value ranges from 1.4 to 2.0 eV. Although the cathode was made of aluminum and titanium, Auger spectra showed no presence of either Al or Ti; argon is also absent from the films produced.<>
Keywords
Auger effect; X-ray diffraction examination of materials; argon; carbon; diamond; energy gap; glow discharges; infrared spectra of inorganic solids; optical constants; organic compounds; plasma CVD; plasma CVD coatings; thin films; 0.01 to 10.0 mbar; 0.1 to 20.0 W; 1.4 to 2.0 eV; Al; Ar; Auger spectra; C; DC hollow cathode; Ti; X-ray diffraction measurements; amorphous; cathode; cross-sectional area; diamondlike; discharge modes; discharge power; gas pressure; glow discharge; graphite; infrared absorption; methane; nonlinear function; optical bandgap; pinhole-type; plasma-enhanced chemical vapor deposition; thin films; Argon; Carbon; Coatings; Diamond; Diffraction; Glow discharges; Infrared spectroscopy; Organic compounds; Plasma CVD; Thin films; X-rays;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location
Buffalo, NY, USA
Type
conf
DOI
10.1109/PLASMA.1989.166164
Filename
166164
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