Title :
Plasma processing of high T/sub c/ superconducting films
Author :
Shaw ; Witanachchi, S. ; Patel, Surabhi ; Kwok, H.S.
Author_Institution :
State Univ. of New York, Buffalo, NY, USA
Abstract :
Summary Form only given, as follows. A method for plasma-assisted laser deposition of thin films has been developed by the authors and used to generate in-situ films at substrate temperatures between 400 degrees C and 500 degrees C without any postannealing. For Y-Ba-Cu-O superconductors, a zero-resistance temperature of about 90 K has been obtained for such substrate materials as SrTiO/sub 3/, ZrO/sub 2/, MgO, sapphire, Si, stainless steel, and Ni. Various surface and plasma analytical techniques have been applied to study the microstructure of the superconducting film and its interaction with the substrate and the plasma.<>
Keywords :
barium compounds; high-temperature superconductors; plasma deposited coatings; superconducting thin films; yttrium compounds; 400 to 500 degC; 90 K; MgO; Ni; Si; SrTiO/sub 3/; Y-Ba-Cu-O; ZrO/sub 2/; analytical techniques; high T/sub c/ superconducting films; high temperature superconductors; in-situ films; microstructure; plasma-assisted laser deposition; sapphire; stainless steel; substrate; surface; thin films; zero-resistance temperature; Barium compounds; Coatings; High-temperature superconductors; Plasma applications; Superconducting films; Vapor deposition; Yttrium compounds;
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
DOI :
10.1109/PLASMA.1989.166168
