Plasma processing of high T/sub c/ superconducting films

Author

Shaw ; Witanachchi, S. ; Patel, Surabhi ; Kwok, H.S.

Author_Institution

State Univ. of New York, Buffalo, NY, USA

fYear

1989

fDate

0-0 1989

Firstpage

115

Lastpage

116

Abstract

Summary Form only given, as follows. A method for plasma-assisted laser deposition of thin films has been developed by the authors and used to generate in-situ films at substrate temperatures between 400 degrees C and 500 degrees C without any postannealing. For Y-Ba-Cu-O superconductors, a zero-resistance temperature of about 90 K has been obtained for such substrate materials as SrTiO/sub 3/, ZrO/sub 2/, MgO, sapphire, Si, stainless steel, and Ni. Various surface and plasma analytical techniques have been applied to study the microstructure of the superconducting film and its interaction with the substrate and the plasma.<>

Keywords

barium compounds; high-temperature superconductors; plasma deposited coatings; superconducting thin films; yttrium compounds; 400 to 500 degC; 90 K; MgO; Ni; Si; SrTiO/sub 3/; Y-Ba-Cu-O; ZrO/sub 2/; analytical techniques; high T/sub c/ superconducting films; high temperature superconductors; in-situ films; microstructure; plasma-assisted laser deposition; sapphire; stainless steel; substrate; surface; thin films; zero-resistance temperature; Barium compounds; Coatings; High-temperature superconductors; Plasma applications; Superconducting films; Vapor deposition; Yttrium compounds;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on

Conference_Location

Buffalo, NY, USA

Type

conf

DOI

10.1109/PLASMA.1989.166168

Filename

166168