Title :
Digest of Papers. Microprocesses and Nanotechnology´98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)
Abstract :
Presents the front cover of the proceedings.
Keywords :
X-ray lithography; coating techniques; electron beam lithography; etching; inspection; ion beam lithography; micromechanical devices; nanotechnology; photolithography; radiation effects; resists; ultraviolet lithography; vacuum microelectronics; vapour deposition; EUV lithography; X-ray lithography; beam induced reaction; deposition; electron ion beam lithography; etching; field emitters; inspection; ion beam lithography; metrology; microprocesses; microsystems; nanodevices; nanofabrication; nanotechnology; optical lithography; resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729891
