DocumentCode :
2336434
Title :
Identification model-based control system design for semiconductor manufacturing equipment
Author :
Hashimoto, Seiji ; Nitta, Mayumi ; Shimosakai, Keisuke ; Konuma, Miho
Author_Institution :
Dept. of Electron. Eng., Gunma Univ., Kiryu, Japan
fYear :
2009
fDate :
25-27 May 2009
Firstpage :
1735
Lastpage :
1740
Abstract :
In high-speed and high-precision control of a precision stage for semiconductor manufacturing, vibration of the axially moving factors leads to operational problems and limits their utility in many applications. Reaction force and vibration controls are a key to improve the control performance. In the present paper, aiming at a systematic design of the both control systems, the 6-degree of freedom (6DOF) equipment is developed. A precision XY stage is mounted on an active vibration isolator. Two counter weights driven by linear actuators are placed eccentric from the center of gravity, i.e., two weights are not co-axial. With the developed equipment, at first, the multi-input and multi-output (MIMO) modeling based on the subspace method is experimentally investigated. Using the identified MIMO model, the reaction force and vibration control systems as well as the positioning system are systematically designed based on the bilateral control strategy. Finally, the effectiveness of the proposed model-based control approach for the integrated design of the precision stage system is verified by the vibration suppression control experiments.
Keywords :
MIMO systems; position control; vibration isolation; MIMO model; active vibration isolator; control system design; position control; semiconductor manufacturing equipment; vibration control; Control system synthesis; Control systems; Counting circuits; Force control; Isolators; Lead compounds; MIMO; Semiconductor device manufacture; Vibration control; Virtual manufacturing; Identification; Position control; Vibration control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industrial Electronics and Applications, 2009. ICIEA 2009. 4th IEEE Conference on
Conference_Location :
Xi´an
Print_ISBN :
978-1-4244-2799-4
Electronic_ISBN :
978-1-4244-2800-7
Type :
conf
DOI :
10.1109/ICIEA.2009.5138494
Filename :
5138494
Link To Document :
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