Title :
Performance Optimization and Parameter Sensitivity Analysis of Ultra Low Power Junctionless MOSFETs
Author :
Parihar, Manoj Singh ; Kranti, Abhinav
Author_Institution :
Low Power Nanoelectron. Res. Group, Indian Inst. of Technol. Indore, Indore, India
Abstract :
The paper investigates the impact of doping concentration on the performance of Ultra Low Power (ULP) Junctionless Double Gate MOSFETs. Results show that intrinsic delay is reduced by 69% and on-off current ratio is increased by 2.5 times when junctionless transistors are designed with a doping concentration of 5×1018 cm-3 as compared to those designed with 3×1019 cm-3. Additional advantage of operating at 5×1018 cm-3 is the significant reduction in the parameter sensitivity values of on-current, off-current and intrinsic delay. JL devices exhibit least sensitivity towards gate length in comparison to other parameters. The results when compared with inversion mode and under lap devices highlight the advantages of junctionless devices for ULP logic technology applications.
Keywords :
MOSFET; low-power electronics; optimisation; JL device; ULP logic technology application; doping concentration; intrinsic delay; inversion mode; on-off current ratio; parameter sensitivity analysis; performance optimization; ultralow power junctionless double gate MOSFET; underlap device; Delays; Doping; Films; Logic gates; MOSFET; Sensitivity; Double Gate MOSFET; Intrinsic delay; Junctionless; Parameter Sensitivity; Ultra Low Power;
Conference_Titel :
VLSI Design and 2014 13th International Conference on Embedded Systems, 2014 27th International Conference on
Conference_Location :
Mumbai
DOI :
10.1109/VLSID.2014.82