Overview of NIST metrology development for the semiconductor industry

Author

Knight, Stephen

Author_Institution

Office of Microelectron. Programs, Nat. Inst. of Stand. & Technol., USA

fYear

2003

fDate

23-26 Sept. 2003

Firstpage

35

Lastpage

44

Abstract

The National Institute of Standards and Technology metrology development for the semiconductor industry and its supporting infrastructure is a broad set of programs directed at many of the critical metrology needs. This paper will give examples of specific projects addressing needs in lithography, critical dimension metrology, gate dielectric characterization, interconnect materials evaluation, wafer surface inspection, mass flow controller calibration, and manufacturing support. The paper will emphasize the role collaboration with industry plays in project selection, project success, and transfer to industry.

Keywords

dielectric measurement; inspection; integrated circuit interconnections; integrated circuit packaging; project engineering; reviews; scanning electron microscopes; ultraviolet lithography; NIST metrology development; National Institute of Standards and Technology; critical dimension metrology; gate dielectric properties; interconnect materials evaluation; lithography; manufacturing support; mass flow controller calibration; project selection; semiconductor industry; specific projects addressing; wafer surface inspection; Calibration; Dielectric materials; Electronics industry; Inspection; Lithography; Manufacturing industries; Metrology; NIST; Semiconductor materials; Weight control;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Thermal Processing of Semiconductors, 2003. RTP 2003. 11th IEEE International Conference on

Print_ISBN

0-7803-7874-1

Type

conf

DOI

10.1109/RTP.2003.1249121

Filename

1249121