Traceable emissivity measurements in RTP using room temperature reflectometry

Author

Hunter, Aaron ; Adams, Bruce ; Ramanujam, Rajesb

Author_Institution

Appl. Mater., Santa Clara, CA, USA

fYear

2003

fDate

23-26 Sept. 2003

Firstpage

85

Lastpage

88

Abstract

The design of an integrating reflectometer specific to the optical and spectral requirements of rapid thermal processing (RTP) is discussed. We report reflectance measurements of various materials. These measurements are correlated to in-situ emittance measurements recorded during rapid thermal processing. We also present the design of an optimized emissometer for an RTP chamber. We propose a means for correlating room temperature reflectance measurements to emittance standards for RTP.

Keywords

emissivity; rapid thermal processing; reflectivity; reflectometers; 293 to 298 K; RTP chamber; emissivity; emissometer; integrating reflectometer; optical properties; rapid thermal processing; reflectance; room temperature reflectance; room temperature reflectometry; spectral properties; Design optimization; Integrated optics; Optical design; Optical materials; Optical recording; Rapid thermal processing; Reflectivity; Reflectometry; Stimulated emission; Temperature measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Thermal Processing of Semiconductors, 2003. RTP 2003. 11th IEEE International Conference on

Print_ISBN

0-7803-7874-1

Type

conf

DOI

10.1109/RTP.2003.1249127

Filename

1249127