DocumentCode
2341526
Title
Batch Reactor design optimization using computational fluid dynamics
Author
Mokhtari, Simin ; Bailey, Jeff
Author_Institution
Thermal Div., ASML, Scotts Valley, CA, USA
fYear
2003
fDate
23-26 Sept. 2003
Firstpage
185
Abstract
In this paper, CFD is an important tool to study, understand, and improve reactor designs, and allows prediction of wafer exposure conditions and on-wafer results early in the equipment design process. The use of CFD can greatly lower development costs and accelerate time-to-market.
Keywords
alumina; chemical reactors; computational fluid dynamics; heat transfer; time to market; Al2O3; CFD; alumina; batch reactor design optimization; computational fluid dynamics; heat transfer; time-to-market; wafer exposure; Acceleration; Chemicals; Computational fluid dynamics; Costs; Design optimization; Fluid flow; Furnaces; Inductors; Process design; Time to market;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Thermal Processing of Semiconductors, 2003. RTP 2003. 11th IEEE International Conference on
Print_ISBN
0-7803-7874-1
Type
conf
DOI
10.1109/RTP.2003.1249146
Filename
1249146
Link To Document