DocumentCode :
2344165
Title :
Modeling and design of a nanoscale memory cell for hardening to a single event with multiple node upset
Author :
Lin, Sheng ; Kim, Yong-Bin ; Lombardi, Fabrizio
Author_Institution :
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
fYear :
2011
fDate :
9-12 Oct. 2011
Firstpage :
320
Lastpage :
325
Abstract :
The occurrence of a multiple node upset is likely to increase significantly in nanoscale CMOS due to reduced device size and power supply voltage scaling. This paper presents a comprehensive treatment (model, analysis and design) for hardening a memory cell against a soft error resulting in a multiple node upset at 32nm feature size in CMOS. A novel 13T memory cell configuration is proposed, analyzed, and simulated to show a better tolerance to the likely multiple node upset, i.e. a transient or soft fault affecting any two nodes in a cell. The proposed hardened memory cell utilizes a Schmitt trigger design; simulation shows that the multiple node upset tolerance is improved by nearly twice as much over existing designs. Moreover the 13T cell achieves a 33% reduction in write delay and only a 5% increase in power consumption compared to the DICE cell (consisting of 12 transistors). Simulation results are provided using the predictive technology file for 32nm feature size in CMOS. Monte Carlo simulation confirms the excellent multiple node upset tolerance of the proposed memory cell in the presence of process, voltage, and temperature variations in their designs.
Keywords :
CMOS memory circuits; Monte Carlo methods; integrated circuit design; integrated circuit modelling; nanoelectronics; radiation hardening (electronics); trigger circuits; 13T memory cell configuration; DICE cell; Monte Carlo simulation; Schmitt trigger design; comprehensive treatment; device size reduction; memory cell hardening; multiple-node upset tolerance; nanoscale CMOS; nanoscale memory cell design; nanoscale memory cell modeling; power consumption; power supply voltage scaling; predictive technology file; process variation; size 32 nm; soft error; temperature variation; voltage variation; write delay; CMOS integrated circuits; Delay; Feedback loop; Integrated circuit modeling; Memory management; Transient analysis; Transistors; Memory design; Nanotechnology; Radiation hardening; Soft Error;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computer Design (ICCD), 2011 IEEE 29th International Conference on
Conference_Location :
Amherst, MA
ISSN :
1063-6404
Print_ISBN :
978-1-4577-1953-0
Type :
conf
DOI :
10.1109/ICCD.2011.6081418
Filename :
6081418
Link To Document :
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