DocumentCode
2344454
Title
High power 4H-SiC thyristors
Author
Palmour, J.W. ; Singh, R. ; Waltz, D.G.
Author_Institution
Cree Res. Inc., Durham, NC, USA
fYear
1996
fDate
26-26 June 1996
Firstpage
54
Lastpage
55
Abstract
For very high voltage, high current devices (>3 kV, >100 A), the use of bipolar SiC devices will be required because of their much higher current densities. These devices have applications in the area of traction control and power transmission. In this report, higher voltage and higher current npnp 4H-SiC thyristors have been achieved. The npnp device is the most promising thyristor structure to date because it allows the use of a low resistivity n-type substrate. A mesa structure was utilized, with all of the doping being done in situ during epitaxy. The device periphery was terminated using a reactive ion etched mesa, and the gate was contacted by performing a trench etch, again with reactive ion etching.
Keywords
semiconductor materials; silicon compounds; thyristors; 100 A; 3 kV; SiC; bipolar npnp device; epitaxy; high power 4H-SiC thyristor; in situ doping; mesa structure; reactive ion etching; trench gate etching; Conductivity; Current density; Doping; Epitaxial growth; Etching; Power transmission; Silicon carbide; Substrates; Thyristors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 1996. Digest. 54th Annual
Conference_Location
Santa Barbara, CA, USA
Print_ISBN
0-7803-3358-6
Type
conf
DOI
10.1109/DRC.1996.546312
Filename
546312
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