DocumentCode :
2344662
Title :
Surface roughness of plasma polymerized films by AFM
Author :
Sudam, Balakrishna M. ; Nichols, Michael F.
Author_Institution :
Nichols Technol. Inc., Columbia, MO, USA
fYear :
1994
fDate :
1994
Firstpage :
844
Abstract :
AFM was used to measure the surface roughness, SR(Rrms) of different substrates; silicon wafer, glass slide and gold wire. Also, plasma polymerized Plasmalene film on aluminum sputtered glass slide was studied in order to correlate the surface roughness of the substrates to the properties of plasma deposited films. Conformality and deposition characteristics of plasma polymerized Plasmalene films were evaluated based on the measured SR(Rrms) values
Keywords :
atomic force microscopy; plasma deposited coatings; surface topography measurement; Al; Au; Si; aluminum sputtered glass slide; conformality; deposition characteristics; gold wire; plasma polymerized Plasmalene film; plasma polymerized films; silicon wafer; Glass; Gold; Plasma measurements; Plasma properties; Polymer films; Rough surfaces; Silicon; Substrates; Surface roughness; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Engineering in Medicine and Biology Society, 1994. Engineering Advances: New Opportunities for Biomedical Engineers. Proceedings of the 16th Annual International Conference of the IEEE
Conference_Location :
Baltimore, MD
Print_ISBN :
0-7803-2050-6
Type :
conf
DOI :
10.1109/IEMBS.1994.415175
Filename :
415175
Link To Document :
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