Title :
IR laser absorption studies of radical concentrations in CF/sub 4/ RF plasmas
Author_Institution :
Aerodyne Res. Inc., Billerica, MA, USA
Abstract :
Summary Form only given, as follows. The author reports infrared tunable diode laser absorption studies of CF/sub 4/ RF process plasmas in a laboratory reactor that allows a long absorption path (about 38 m). Results to date show a strong dependence on the properties of the reactor surfaces. The molecular species whose concentrations have been measured include CF/sub 2/ and C/sub 2/F/sub 6/. Other CF/sub 4/ plasma species for which spectral searches are planned include F atoms, CF, and CF/sub 3/. In addition, estimates of the plasma temperature can be obtained from rotational line absorption intensities. These observations are made for ranges of reactor parameters, including RF power, pressure, and O/sub 2/ or H/sub 2/ additions.<>
Keywords :
free radicals; organic compounds; plasma diagnostics by laser beam; plasma temperature; 38 m; CF; CF/sub 2/; CF/sub 3/; F atoms; H/sub 2/; IR laser absorption; O/sub 2/; RF power; absorption path; hexafluoroethane; laboratory reactor; molecular species; plasma temperature; pressure; radical concentrations; rotational line absorption intensities; tetrafluoromethane RF plasmas; tunable diode laser absorption; Organic compounds; Plasma measurements; Plasma properties; Temperature;
Conference_Titel :
Plasma Science, 1989. IEEE Conference Record - Abstracts., 1989 IEEE International Conference on
Conference_Location :
Buffalo, NY, USA
DOI :
10.1109/PLASMA.1989.166272
