DocumentCode
2346448
Title
The Wheatstone bridge as an alignment test structure
Author
Kaempf, Ulrich
Author_Institution
Hewlett-Packard/Sematech Co., Austin, TX, USA
fYear
1995
fDate
22-25 Mar 1995
Firstpage
27
Lastpage
32
Abstract
A new test structure for the electrical measurement of level-to-level registration is introduced. This structure, based on the Wheatstone bridge measurement principle, offers improved accuracy over the conventional U-shaped test structure. With the described Wheatstone bridge method, the registration error (misalignment) is directly proportional to a single voltage. In contrast, the misalignment of the U-shaped structure is calculated from the difference of two voltages, an operation that can result in poor precision. The paper describes a two-by-twelve contact pad module, which includes two Wheatstone bridge structures to measure the misalignment in the X- and Y-directions, two calibration structures to determine the zero- and full-scale accuracy, and a Van der Pauw structure to measure the sheet resistance of the conducting material as required for the alignment measurement. The mathematical expressions are derived, and actual test results are discussed
Keywords
bridge circuits; bridge instruments; calibration; integrated circuit measurement; integrated circuit testing; measurement errors; spatial variables measurement; voltage measurement; Van der Pauw structure; Wheatstone bridge; alignment test structure; calibration structures; electrical measurement; level-to-level registration; misalignment; registration error; sheet resistance; Bridge circuits; Circuit testing; Conducting materials; Electrical resistance measurement; Etching; Instruments; Integrated circuit measurements; Leg; Measurement errors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 1995. ICMTS 1995. Proceedings of the 1995 International Conference on
Conference_Location
Nara
Print_ISBN
0-7803-2065-4
Type
conf
DOI
10.1109/ICMTS.1995.513940
Filename
513940
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