• DocumentCode
    2346472
  • Title

    Recent advances in GaAs devices for use at high temperatures

  • Author

    Würfl, J.

  • Author_Institution
    Inst. fur Hochstfrequenztech., Berlin, Germany
  • fYear
    1998
  • fDate
    22-27 Feb 1998
  • Firstpage
    106
  • Lastpage
    116
  • Abstract
    A review of technologies for GaAs high temperature electronic devices and integrated circuits is presented. Starting with the high temperature related material properties of GaAs and related heterostructures, key issues for GaAs-based high temperature devices are identified and state of the art solutions are discussed. This includes, for example, high temperature stable metallizations, technologies for substrate leakage reduction and other topics. Based on these results, the most important transistor technologies for high temperature applications (MESFETs, HFETs, HEMTs, JFETs and HBTs) are introduced and compared. The paper closes with a short review of analogue and microwave integrated circuits operating at high temperatures
  • Keywords
    III-V semiconductors; MESFET integrated circuits; Schottky gate field effect transistors; field effect MMIC; field effect analogue integrated circuits; field effect transistors; gallium arsenide; heterojunction bipolar transistors; high electron mobility transistors; high-temperature electronics; integrated circuit interconnections; integrated circuit metallisation; junction gate field effect transistors; leakage currents; reviews; semiconductor device metallisation; thermal stability; GaAs; GaAs devices; GaAs heterostructures; GaAs high temperature electronic devices; GaAs high temperature integrated circuits; HBTs; HEMTs; HFETs; JFETs; MESFETs; analogue integrated circuits; high temperature related material properties; high temperature stable metallizations; high temperature transistor technologies; microwave integrated circuits; substrate leakage reduction technology; Gallium arsenide; HEMTs; Integrated circuit technology; JFETs; MESFETs; MODFETs; Material properties; Metallization; Microwave transistors; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High-Temperature Electronic Materials, Devices and Sensors Conference, 1998
  • Conference_Location
    San Diego, CA
  • Print_ISBN
    0-7803-4437-5
  • Type

    conf

  • DOI
    10.1109/HTEMDS.1998.730659
  • Filename
    730659