Title :
Asymmetric self-cascode configuration to improve the analog performance of SOI nMOS transistors
Author :
de Souza, M. ; Flandre, Denis ; Pavanello, M.A.
Author_Institution :
Dept. of Electr. Eng., FEI, Brazil
Abstract :
A recent work showed that gD of long-channel self-cascode transistors can be further reduced by replacing M2 with a transistor with intrinsic concentration in the channel. In order to extend this proposal to more recent technologies, the current work presents an analysis of short-channel asymmetric self-cascode transistors implemented using a multi-threshold voltage commercial process. Numerical simulations were also performed aiming to extend the study, searching for the optimal doping concentration and length for M1 and M2.
Keywords :
MOSFET; silicon-on-insulator; SOI; analog performance; asymmetric self cascode configuration; long channel self cascode transistors; multi threshold voltage commercial process; nMOS transistors; short channel asymmetric self cascode transistors; Degradation; Doping; Logic gates; MOSFETs; Numerical simulation; Threshold voltage;
Conference_Titel :
SOI Conference (SOI), 2011 IEEE International
Conference_Location :
Tempe, AZ
Print_ISBN :
978-1-61284-761-0
Electronic_ISBN :
1078-621X
DOI :
10.1109/SOI.2011.6081716