DocumentCode
2351920
Title
SOI characterization using AOTF polarimetric hyperspectral imaging
Author
Cheng, Li-jen ; Li, Guann-Pyng ; Zang, De Yu
Author_Institution
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
fYear
1994
fDate
3-6 Oct 1994
Firstpage
91
Lastpage
92
Abstract
This paper presents a new technique to measure white light interference patterns as a function of wavelength and polarization for SOI characterization. This technique is not only capable of measuring layer thickness and uniformity, but also able to detect and map imperfections in the SOI structure. The measuring instrument is an acousto-optic tunable filter (AOTF) polarimetric hyperspectral imaging (PHI) system. Functionally, AOTF is a fast programmable, high-resolution spectral bandpass filter with polarization beamsplitting capability. With proper optics and focal plane arrays, one can use it to build an instrument capable of taking images as a function of wavelength and polarization
Keywords
acousto-optical filters; light interferometry; polarimetry; silicon-on-insulator; AOTF polarimetric hyperspectral imaging; SOI; Si; acousto-optic tunable filter; focal plane arrays; imperfections; layer thickness; layer uniformity; polarization beam splitting; programmable spectral bandpass filter; white light interference patterns; Acoustic signal detection; Band pass filters; Hyperspectral imaging; Instruments; Interference; Optical arrays; Optical filters; Optical polarization; Thickness measurement; Wavelength measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 1994 Proceedings., 1994 IEEE International
Conference_Location
Nantucket, MA
Print_ISBN
0-7803-2406-4
Type
conf
DOI
10.1109/SOI.1994.514261
Filename
514261
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