• DocumentCode
    235225
  • Title

    Formic acid treatment with Pt catalyst for Cu direct and hybrid bonding at low temperature

  • Author

    Suga, Takashi ; Akaike, Masakate ; Wenhua Yang

  • Author_Institution
    Dept. of Precision Eng., Univ. of Tokyo, Tokyo, Japan
  • fYear
    2014
  • fDate
    27-30 May 2014
  • Firstpage
    1143
  • Lastpage
    1147
  • Abstract
    A new process of Cu-Cu direct bonding at lower than 200°C in atmospheric atmosphere was developed. The method is composed of formic acid treatment with Pt catalyst. To demonstrate the feasibility of the method, Cu electrodes samples were designed for characterizing the bonding strength and the contact resistance for the Cu-Cu direct bonding. The bonding strength is about 40MPa, and the contact resistance at the bonding interface is about 0.17mΩ. Both of them are better than those without Pt catalyst. The effects of the Pt catalyst on bonding were investigated and it is concluded that the surface oxide of Cu is reduced effectively by the hydrogen radical generated by formic acid decomposition with Pt catalyst and the Cu formats resulted by the formic acid treatment is decomposed to precipitate very fine Cu grains at the bonded interface.
  • Keywords
    bonding processes; catalysts; contact resistance; copper; electrodes; organic compounds; platinum; surface treatment; Cu; Cu-Cu direct bonding; Pt; bonding interface; bonding strength; contact resistance; electrodes sample; formic acid decomposition; formic acid treatment; hybrid bonding; hydrogen radical; low temperature; oxide surface; platinum catalyst; Bonding; Contact resistance; Electrical resistance measurement; Electrodes; Plasmas; Surface resistance; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2014 IEEE 64th
  • Conference_Location
    Orlando, FL
  • Type

    conf

  • DOI
    10.1109/ECTC.2014.6897433
  • Filename
    6897433