DocumentCode
235225
Title
Formic acid treatment with Pt catalyst for Cu direct and hybrid bonding at low temperature
Author
Suga, Takashi ; Akaike, Masakate ; Wenhua Yang
Author_Institution
Dept. of Precision Eng., Univ. of Tokyo, Tokyo, Japan
fYear
2014
fDate
27-30 May 2014
Firstpage
1143
Lastpage
1147
Abstract
A new process of Cu-Cu direct bonding at lower than 200°C in atmospheric atmosphere was developed. The method is composed of formic acid treatment with Pt catalyst. To demonstrate the feasibility of the method, Cu electrodes samples were designed for characterizing the bonding strength and the contact resistance for the Cu-Cu direct bonding. The bonding strength is about 40MPa, and the contact resistance at the bonding interface is about 0.17mΩ. Both of them are better than those without Pt catalyst. The effects of the Pt catalyst on bonding were investigated and it is concluded that the surface oxide of Cu is reduced effectively by the hydrogen radical generated by formic acid decomposition with Pt catalyst and the Cu formats resulted by the formic acid treatment is decomposed to precipitate very fine Cu grains at the bonded interface.
Keywords
bonding processes; catalysts; contact resistance; copper; electrodes; organic compounds; platinum; surface treatment; Cu; Cu-Cu direct bonding; Pt; bonding interface; bonding strength; contact resistance; electrodes sample; formic acid decomposition; formic acid treatment; hybrid bonding; hydrogen radical; low temperature; oxide surface; platinum catalyst; Bonding; Contact resistance; Electrical resistance measurement; Electrodes; Plasmas; Surface resistance; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC), 2014 IEEE 64th
Conference_Location
Orlando, FL
Type
conf
DOI
10.1109/ECTC.2014.6897433
Filename
6897433
Link To Document