DocumentCode :
2353320
Title :
Ga/sub 0.47/In/sub 0.53/As-InP HEMTs with novel GaP/sub 0.35/Sb/sub 0.65/ Schottky layers grown by MOVPE
Author :
Matloubian, M. ; Docter, D. ; Nguyen, C. ; Liu, T. ; Bui, S. ; Ngo, C.
Author_Institution :
HRL Labs., Malibu, CA, USA
fYear :
1998
fDate :
22-24 June 1998
Firstpage :
32
Lastpage :
33
Abstract :
In this paper, we report on the first HEMT fabricated using a novel GaP/sub 0.35/Sb/sub 0.65/ Schottky layer. The AlGaPSb materials system provides the potential for a new class of HEMT devices with a performance that exceeds the Al/sub 0.48/In/sub 0.52/As-Ga/sub 0.47/In/sub 0.53/As materials system. One of the advantages of the PSb materials system (AlGaPSb) is that it can be grown lattice-matched to both InP and GaAs substrates. The bandgap of AlPSb lattice-matched to InP substrate is approximately 1.93 eV, while when lattice matched to GaAs substrates, the bandgap of AlPSb is 2.3 eV. In addition, the GaP/sub 0.35/Sb/sub 0.65/-Ga/sub 0.47/In/sub 0.53/As materials system has a conduction band discontinuity of -0.6 eV and for the AlP/sub 0.39/Sb/sub 0.61/-Ga/sub 0.47/In/sub 0.53/As materials system, the conduction discontinuity is approximately 1.06 eV. The wide bandgap combined with the large conduction band discontinuity for the AlGaPSb materials system should lead to development of high-performance millimeter wave low-noise and power HEMTs. We have demonstrated a GaP/sub 0.35/Sb/sub 0.65/-Ga/sub 0.47/In/sub 0.53/As HEMT on InP substrate as a first step toward the demonstration of an AlP/sub 0.39/Sb/sub 0.61/-Ga/sub 0.47/In/sub 0.53/As HEMT.
Keywords :
III-V semiconductors; MOCVD; Schottky barriers; conduction bands; gallium arsenide; gallium compounds; high electron mobility transistors; indium compounds; millimetre wave field effect transistors; power HEMT; semiconductor growth; vapour phase epitaxial growth; wide band gap semiconductors; 1.93 eV; 2.3 eV; Al/sub 0.48/In/sub 0.52/As-Ga/sub 0.47/In/sub 0.53/As; Al/sub 0.48/In/sub 0.52/As-Ga/sub 0.47/In/sub 0.53/As materials system; AlGaPSb materials system; AlP/sub 0.39/Sb/sub 0.61/-Ga/sub 0.47/In/sub 0.53/As; AlP/sub 0.39/Sb/sub 0.61/-Ga/sub 0.47/In/sub 0.53/As HEMT; AlP/sub 0.39/Sb/sub 0.61/-Ga/sub 0.47/In/sub 0.53/As materials system; AlPSb bandgap; Ga/sub 0.47/In/sub 0.53/As-InP HEMTs; GaAs; GaAs substrates; GaP/sub 0.35/Sb/sub 0.65/ Schottky layers; GaP/sub 0.35/Sb/sub 0.65/-Ga/sub 0.47/In/sub 0.53/As; GaP/sub 0.35/Sb/sub 0.65/-Ga/sub 0.47/In/sub 0.53/As HEMT; GaP/sub 0.35/Sb/sub 0.65/-Ga/sub 0.47/In/sub 0.53/As materials system; GaP/sub 0.35/Sb/sub 0.65/-Ga/sub 0.47/In/sub 0.53/As-InP; InP; InP substrates; MOVPE; PSb materials system; conduction band discontinuity; lattice-matched growth; low-noise HEMTs; millimeter wave HEMTs; power HEMTs; wide bandgap; Epitaxial growth; Epitaxial layers; HEMTs; Indium phosphide; MODFETs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference Digest, 1998. 56th Annual
Conference_Location :
Charlottesville, VA, USA
Print_ISBN :
0-7803-4995-4
Type :
conf
DOI :
10.1109/DRC.1998.731109
Filename :
731109
Link To Document :
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