• DocumentCode
    2353405
  • Title

    High performance CMOS compatible bistable operation at extremely low supply voltage by a novel Si interband tunneling diode

  • Author

    Morita, K. ; Sorada, H. ; Morimoto, K. ; Yuki, K. ; Yoshii, S. ; Niwa, M. ; Uenoyama, T. ; Ohnaka, K.

  • Author_Institution
    Central Res. Labs., Matsushita Electr. Ind. Co. Ltd., Osaka, Japan
  • fYear
    1998
  • fDate
    22-24 June 1998
  • Firstpage
    42
  • Lastpage
    43
  • Abstract
    The supply voltage of Si ULSIs must be reduced below 0.5 V, the lower limit for conventional CMOS, in order to suppress power consumption. A quantum effect device is one of the most promising candidates to overcome this problem. However, few devices have been proposed to achieve CMOS compatible bistable operation (i.e. maximum output voltage is equal to supply voltage) below 0.5 V at room temperature using Si. The purpose of this work is to realise CMOS compatible bistable operation below 0.5 V at room temperature by means of a novel interband tunneling diode using Si materials, and to demonstrate the possibilities of such a device for multistate memory.
  • Keywords
    CMOS digital integrated circuits; elemental semiconductors; integrated memory circuits; silicon; tunnel diodes; 0.5 V; 20 C; CMOS compatible bistable operation; CMOS supply voltage; Si; Si ULSIs; Si interband tunneling diode; Si materials; interband tunneling diode; maximum output voltage; multistate memory; power consumption; quantum effect device; room temperature operation; supply voltage; Low voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference Digest, 1998. 56th Annual
  • Conference_Location
    Charlottesville, VA, USA
  • Print_ISBN
    0-7803-4995-4
  • Type

    conf

  • DOI
    10.1109/DRC.1998.731113
  • Filename
    731113