• DocumentCode
    2354123
  • Title

    Tungsten-rich deposits at anode using carbon nanotube emitters

  • Author

    Arai, Fumihito ; Liu, Pou ; Dong, Luin ; Nakajima, Masahiro ; Fukuda, Toshio

  • Author_Institution
    Dept. of Micro Syst. Eng., Nagoya Univ., Japan
  • fYear
    2003
  • fDate
    19-22 Oct. 2003
  • Firstpage
    205
  • Lastpage
    210
  • Abstract
    Electron-beam-induced deposition (EBID) with two kinds of organometallic compounds including tungsten hexacarbonyl (W(CO)6) and dimethyl-gold ((CH3)2(C5H7O2)Au) as precursors is presented so as to obtain conductive nanostructures. Their resistivity and growth rate are measured, and the compositions of deposits are analyzed. To improve the resolution of the deposit and to reduce energy consumption, EBID with multiwalled carbon nanotubes (MWNTs) as emitters is demonstrated. Factors influencing field emission characteristics of MWNT emitters are analyzed. In the deposit at anode by using W(CO)6, mass of the tungsten reaches up to about 80% among the compositions.
  • Keywords
    anodes; carbon nanotubes; conducting materials; electron beam deposition; electron field emission; nanostructured materials; nanotube devices; tungsten compounds; W(CO)6; anode; carbon nanotube emitters; conductive nanostructures; dimethyl-gold; electron-beam-induced deposition; field emission characteristics; tungsten hexacarbonyl; tungsten-rich deposits; Anodes; Carbon dioxide; Carbon nanotubes; Electron emission; Mechanical factors; Microscopy; Systems engineering and theory; Tungsten; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micromechatronics and Human Science, 2003. MHS 2003. Proceedings of 2003 International Symposium on
  • Print_ISBN
    0-7803-8165-3
  • Type

    conf

  • DOI
    10.1109/MHS.2003.1249933
  • Filename
    1249933