DocumentCode :
2355348
Title :
Design of high-yield defect-tolerant self-assembled nanoscale memories
Author :
Venkatasubramanian, Girish ; Boykin, P. Oscar ; Figueiredo, Renato J.
Author_Institution :
Univ. of Florida, Gainesville
fYear :
2007
fDate :
21-22 Oct. 2007
Firstpage :
77
Lastpage :
84
Abstract :
Self-assembled nanoscale memories experience a high degree of hard defects compared to microscale memories. These defects degrade the yield and, along with operational faults, degrade the mean time to failure (MTTF). The common way to tolerate these defects is to reconfigure the defective elements with spares. Hence, the amount of spares is very important and a systematic yield-driven design approach to decide the amount and the allocation of these spares is essential. In this paper, we develop such a design method. We formulate a probabilistic model for the reliability of a memory considering an unclustered defect distribution with error correcting code and reconfiguration using spares local to the lowest hierarchical sub-unit. Using this model, we estimate the yield and MTTF of the memory and develop a method to design the memory for high yield.
Keywords :
VLSI; error correction codes; fault tolerance; integrated circuit design; integrated circuit reliability; integrated circuit yield; integrated memory circuits; nanoelectronics; probability; reconfigurable architectures; self-assembly; degree of hard defects; error correcting code; high-yield defect-tolerant self-assembled nanoscale memories design; mean time-to-failure degradation; memory reliability; operational faults; probabilistic model; systematic yield-driven design approach; unclustered defect distribution; Degradation; Design methodology; Error correction codes; Fault tolerance; Information systems; Laboratories; Predictive models; Redundancy; Self-assembly; Yield estimation; Nanomemories; defect tolerance; yield;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoscale Architectures, 2007. NANOSARCH 2007. IEEE International Symposium on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-1791-9
Electronic_ISBN :
978-1-4244-1791-9
Type :
conf
DOI :
10.1109/NANOARCH.2007.4400861
Filename :
4400861
Link To Document :
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