DocumentCode :
2355379
Title :
Thermal annealing of the Si/SiO2 interface probed by surface nonlinear optical techniques
Author :
Meyer, C. ; Welter, Friederike ; Emmerichs, U. ; Kurz, H. ; Yasuda, Toshiyuki ; Lucovsky, Gerry
fYear :
1994
fDate :
28 Aug-2 Sep 1994
Firstpage :
174
Lastpage :
175
Keywords :
Absorption; Annealing; Biomedical optical imaging; Curve fitting; Frequency measurement; Nonlinear optics; Optical films; Optical pulses; Optical surface waves; Pulse measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Europe, 1994 Conference on
Print_ISBN :
0-7803-1789-0
Type :
conf
DOI :
10.1109/CLEOE.1994.636314
Filename :
636314
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2355379
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