DocumentCode :
2355784
Title :
P2N-2 High Frequency Resonators with Excellent Temperature Characteristic Using Edge Reflection
Author :
Kadota, Michio ; Kimura, Tetsuya ; Tamasaki, Daisuke
Author_Institution :
Murata MFG. Co.,Ltd, Shiga
fYear :
2006
fDate :
2-6 Oct. 2006
Firstpage :
1878
Lastpage :
1882
Abstract :
Most surface acoustic wave (SAW) radio frequency (RF) filters and duplexers have the Al-electrodes/36-48degYX-LiTaO3 substrate structure, which has an optimum coupling factor and an optimum reflection coefficient but does not have a good temperature coefficient of frequency (TCF). The TCF can be improved by depositing SiO2 film with positive TCF on a transversal SAW filter consisting of a substrate with negative TCF such as LiTaO3 and LiNbO3. However, resonator-type SAW devices combining SiO 2 film, Al electrodes, and LiTaO3 substrate do not show a good frequency characteristics regardless of Al thickness. Because both (a) a SiO2/thin Al-electrodes/LiTaO3 structure with small convex portions on the SiO2surface and (b) a flattened SiO2/Al-electrodes/LiTaO3 structure have a small reflection coefficient, and (c) a SiO2/thick Al-electrodes/LiTaO3 structure with large convex portions has a small coupling factor. It is considered as a counter-measure that a resonator using the reflection of a shear horizontal (SH) wave at substrate edges of their structures shows a good frequency characteristic because its reflection coefficient is very large regardless of Al thickness. It has been difficult to obtain a high-frequency edge reflection resonator because it requires too fine substrate edges for ordinary machining techniques. However, a high-frequency edge reflection resonator with a good TCF and an excellent frequency characteristic has been realized using our newly developed method of obtaining fine edges
Keywords :
aluminium; lithium compounds; silicon compounds; substrates; surface acoustic wave resonator filters; surface acoustic wave resonators; SiO2-Al-LiTaO3; high-frequency edge reflection resonator; optimum coupling factor; reflection coefficient; resonator-type SAW devices; shear horizontal wave; substrate structure; surface acoustic wave duplexers; surface acoustic wave radio frequency filter; surface acoustic wave resonators; temperature characteristic; temperature coefficient of frequency; transversal SAW filter; Acoustic reflection; Acoustic waves; Optical films; Radio frequency; Resonant frequency; Resonator filters; SAW filters; Substrates; Surface acoustic waves; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium, 2006. IEEE
Conference_Location :
Vancouver, BC
ISSN :
1051-0117
Print_ISBN :
1-4244-0201-8
Electronic_ISBN :
1051-0117
Type :
conf
DOI :
10.1109/ULTSYM.2006.474
Filename :
4152330
Link To Document :
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