Title :
Formation of high ouality epitaxial layer for an improved GTO
Author :
Watanabe, M. ; Takahashi, Y. ; Yamada, O. ; Tagami, S. ; Kirihata, H.
Author_Institution :
Fuji Electric Corporate Research & Development, Ltd.
Keywords :
Annealing; Atmosphere; Boron; Epitaxial layers; Impurities; Particle beam optics; Stacking; Testing; Thyristors; Voltage;
Conference_Titel :
Power Semiconductor Devices and ICs, 1992. ISPSD '92. Proceedings of the 4th International Symposium on
DOI :
10.1109/ISPSD.1992.991244
