DocumentCode :
2356904
Title :
Simulation of a 700 V high-voltage device structure on a thin SOI - substrate bias effect on SOI devices
Author :
Matsudai, Tomoko ; Nakagawa, Akio
Author_Institution :
Toshiba R&D Center
fYear :
1992
fDate :
1992
Firstpage :
272
Lastpage :
277
Keywords :
Anodes; Breakdown voltage; Cathodes; Dielectric substrates; Diodes; Impurities; Isolation technology; Power integrated circuits; Semiconductor films; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 1992. ISPSD '92. Proceedings of the 4th International Symposium on
Type :
conf
DOI :
10.1109/ISPSD.1992.991285
Filename :
991285
Link To Document :
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