DocumentCode
235708
Title
Reducing slurry agglomeration with low shear filtration
Author
Yi Wei Lu ; Shie, Bob ; Tsou, Dean ; Hsiao, Steven ; Wang, Huifang
Author_Institution
Asia Applic. Dev. & Lab., Entegris Inc., Hsinchu, Taiwan
fYear
2014
fDate
19-21 Nov. 2014
Firstpage
291
Lastpage
295
Abstract
This study will focus on the agglomerate behavior of major abrasives (colloidal silica and ceria) and show the benefits of proper filter selection for slurry quality control.
Keywords
abrasives; chemical mechanical polishing; filtration; quality control; slurries; abrasives; agglomerate behavior; colloidal silica; low shear filtration; slurry agglomeration; slurry quality control; Abrasives; Filtration; Force; Silicon compounds; Slurries; Standards; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Planarization/CMP Technology (ICPT), 2014 International Conference on
Conference_Location
Kobe
Print_ISBN
978-1-4799-5556-5
Type
conf
DOI
10.1109/ICPT.2014.7017302
Filename
7017302
Link To Document