Title :
Reducing slurry agglomeration with low shear filtration
Author :
Yi Wei Lu ; Shie, Bob ; Tsou, Dean ; Hsiao, Steven ; Wang, Huifang
Author_Institution :
Asia Applic. Dev. & Lab., Entegris Inc., Hsinchu, Taiwan
Abstract :
This study will focus on the agglomerate behavior of major abrasives (colloidal silica and ceria) and show the benefits of proper filter selection for slurry quality control.
Keywords :
abrasives; chemical mechanical polishing; filtration; quality control; slurries; abrasives; agglomerate behavior; colloidal silica; low shear filtration; slurry agglomeration; slurry quality control; Abrasives; Filtration; Force; Silicon compounds; Slurries; Standards; Stress;
Conference_Titel :
Planarization/CMP Technology (ICPT), 2014 International Conference on
Conference_Location :
Kobe
Print_ISBN :
978-1-4799-5556-5
DOI :
10.1109/ICPT.2014.7017302
