DocumentCode :
2357445
Title :
Estimation of amorphous fraction in multilevel phase change memory cells
Author :
Papandreou, N. ; Pantazi, A. ; Sebastian, A. ; Eleftheriou, E. ; Breitwisch, M.J. ; Lam, Chris ; Pozidis, H.
Author_Institution :
IBM Zurich Res. Lab., Ruschlikon, Switzerland
fYear :
2009
fDate :
14-18 Sept. 2009
Firstpage :
209
Lastpage :
212
Abstract :
The effective thickness of the amorphous chalcogenide part within the active element of a phase change memory (PCM) cell is estimated through electrical measurements. Current-voltage characteristics obtained at various intermediate cell states are fitted with the trap-limited subthreshold transport model and the amorphous part thickness is then extracted. Several cell electrical measures, such as the resistance and the threshold voltage, are shown to closely relate to the estimated parameter. The results serve to further validate the trap-limited conduction model, as well as the series phase distribution hypothesis in the active layer of a PCM cell.
Keywords :
antimony compounds; chalcogenide glasses; electric resistance measurement; germanium compounds; phase change memories; semiconductor device models; Ge2Sb2Te3; amorphous chalcogenide; amorphous fraction estimation; current-voltage characteristics; electrical resistance; multilevel phase change memory cells; series phase distribution; threshold voltage; trap-limited conduction model; trap-limited subthreshold transport model; Amorphous materials; Current-voltage characteristics; Electric resistance; Electric variables measurement; Electrical resistance measurement; Phase change materials; Phase change memory; Phase estimation; Phase measurement; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 2009. ESSDERC '09. Proceedings of the European
Conference_Location :
Athens
ISSN :
1930-8876
Print_ISBN :
978-1-4244-4351-2
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2009.5331303
Filename :
5331303
Link To Document :
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