• DocumentCode
    2357901
  • Title

    Steady state model of a micro loop heat pipe

  • Author

    Kim, Jake ; Golliher, Eric

  • fYear
    2002
  • fDate
    12-14 March 2002
  • Firstpage
    137
  • Lastpage
    144
  • Abstract
    Loop Heat Pipes (LHP) have been demonstrated to be able to passively transport orders of magnitude more heat than conventional heat pipes, and offer other functional and performance advantages that have popularized its use in the aerospace industry. Developments at the NASA Glenn Research Center and the University of Cincinnati have produced micro-machining techniques for silicon that will be used to manufacture microchip scale LHP (/spl mu/LHP) with application potential for cooling of individual chips as an integrated package. To aid in its design and to ascertain its performance potential, a proven steady state analytical model developed by TTH Research for a large ammonia LHP was modified and further developed for microchip scale analysis with water working fluid. Without accounting for heat spreading efficiency across the evaporator wick surface, results show that the loop could accommodate more than 600 W/cm/sup 2/ of heat load. However, its operating (fluid) temperature was limited to >90/spl deg/C, even at moderate heat loads, regardless of condenser sink temperature, which could have adverse implications in terms of life and reliability of the component being cooled.
  • Keywords
    cooling; heat pipes; micromachining; reliability; thermal management (packaging); 90 degC; LHP; NASA Glenn Research Center; TTH Research; University of Cincinnati; aerospace industry; condenser sink temperature; cooling; integrated package; micro loop heat pipe; micro-machining techniques; reliability; steady state analytical model; steady state model; Aerospace industry; Analytical models; Chip scale packaging; Cooling; Manufacturing; NASA; Performance analysis; Silicon; Steady-state; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Thermal Measurement and Management, 2002. Eighteenth Annual IEEE Symposium
  • Conference_Location
    San Jose, CA, USA
  • ISSN
    1065-2221
  • Print_ISBN
    0-7803-7327-8
  • Type

    conf

  • DOI
    10.1109/STHERM.2002.991359
  • Filename
    991359