DocumentCode
2357922
Title
Optimum pressure in low temperature direct metal bonding
Author
Ang, X.F. ; Liu, H.P. ; Tan, Y.L. ; Lu, H.J. ; Wei, J. ; Zhang, H.J. ; Chen, Z. ; Wong, C.C.
Author_Institution
Singapore Inst. of Manuf. Technol., Singapore, Singapore
fYear
2010
fDate
8-10 Dec. 2010
Firstpage
251
Lastpage
254
Abstract
The influence of bonding pressure during low temperature direct metal bond formation between gold studs and electroplated copper joints respectively was evaluated. The findings obtained showed an optimum pressure where bond strength peaks before degrading at further increase in bond pressure. Furthermore, it was found that the increase in bond strength does not correspond to a relative dilation of the bonded area. Both observations deviate from the common understanding that higher bond strength can be achieved with higher bonding pressure and corresponding increase in bonded area. Such contradiction is possibly related to the interfacial deformation phenomenon between locally bonded sites at the interface rather than the bulk deformation behaviour of the bump when bonding pressure exceeds a critical value.
Keywords
bonding processes; copper; electroplating; gold; bond strength; bonding pressure; bulk deformation behaviour; electroplated copper joint; gold stud; interfacial deformation; low temperature direct metal bonding; optimum pressure;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Packaging Technology Conference (EPTC), 2010 12th
Conference_Location
Singapore
Print_ISBN
978-1-4244-8560-4
Electronic_ISBN
978-1-4244-8561-1
Type
conf
DOI
10.1109/EPTC.2010.5702642
Filename
5702642
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