P3O-2 Fast Evaluation of Piezoelectric Aluminum Nitride Films by Infrared Optical Techniques

Author

Clement, M. ; Iborra, E. ; Olivares, J. ; Gonzalez-Castilla, S. ; Sanz-Hervas, A. ; Vergara, L. ; Sangrador, J.

Author_Institution

Grupo de Microsistemas y Materiales Electronicos, Univ. Politecnica de Madrid

fYear

2006

fDate

2-6 Oct. 2006

Firstpage

2297

Lastpage

2300

Abstract

Aluminum nitride (AlN) thin films of different crystal qualities have been evaluated by Fourier transform infrared spectrophotometry (FTIR) in the transmittance and reflectance modes. The positions and intensities of the longitudinal optical (LO) and transverse optical (TO) modes in the IR spectra have been correlated with the morphological properties of the films, assessed by X-ray diffraction (XRD) and atomic force microscopy (AFM), and with their piezoelectric response. FTIR proves itself to be a very convenient technique for the fast evaluation of AlN films for their application in electroacoustic devices

Keywords

Fourier transform spectra; X-ray diffraction; acoustoelectric devices; aluminium compounds; atomic force microscopy; infrared spectra; piezoelectric thin films; AFM; AlN; FTIR; Fourier transform infrared spectrophotometry; X-ray diffraction; XRD; atomic force microscopy; crystal quality; electroacoustic devices; film morphology; infrared optical techniques; infrared spectra; longitudinal optical mode; piezoelectric aluminum nitride films; reflectance mode; transmittance mode; transverse optical mode; Aluminum nitride; Atom optics; Atomic force microscopy; Fourier transforms; Infrared spectra; Optical films; Optical microscopy; Piezoelectric films; Reflectivity; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

Ultrasonics Symposium, 2006. IEEE

Conference_Location

Vancouver, BC

ISSN

1051-0117

Print_ISBN

1-4244-0201-8

Electronic_ISBN

1051-0117

Type

conf

DOI

10.1109/ULTSYM.2006.578

Filename

4152434