Development of dynamic mask photolithography system

Author

Cheng, Yih-Lin ; Li, Meng-Long ; Lin, Jiang-Hong ; Lai, Jia-Hung ; Ke, Chang-Tai ; Yu-Chia Huang

Author_Institution

Dept. of Mech. Eng., Nat. Taiwan Univ. of Sci. & Technlogy, Taipei, Taiwan

fYear

2005

fDate

10-12 July 2005

Firstpage

467

Lastpage

471

Abstract

Masks have played an important role in the lithography process, but it takes time and money to make a quartz mask. In rapid prototyping (RP) technologies, curing of photopolymers is mainly achieved by laser scanning with limited fabrication speed. In this project, the dynamic mask technology is implemented to develop a dynamic mask photolithography system which requires no expensive quartz mask and is expected to fabricate parts faster than laser scanning. Digital micro-mirror device (DMD) from digital light processing (DLP) technology by Texas Instruments is used as a dynamic mask generator. Instead of using visible light in DLP, UV light source is utilized, hence, more photopolymers can be used in this system.

Keywords

curing; masks; micromirrors; monolithic integrated circuits; optical polymers; rapid prototyping (industrial); ultraviolet lithography; Texas Instruments; UV light source; curing; digital light processing technology; digital micro-mirror device; dynamic mask photolithography system; laser scanning; photopolymers; quartz mask; rapid prototyping; Curing; Instruments; Laser sintering; Laser theory; Light sources; Lithography; Mechanical engineering; Optical device fabrication; Prototypes; Switches;

fLanguage

English

Publisher

ieee

Conference_Titel

Mechatronics, 2005. ICM '05. IEEE International Conference on

Print_ISBN

0-7803-8998-0

Type

conf

DOI

10.1109/ICMECH.2005.1529302

Filename

1529302