DocumentCode :
2358999
Title :
N-type single nanoparticle ZnO transistors processed at low temperature
Author :
Wolff, Karsten ; Hilleringmann, Ulrich
Author_Institution :
Inst. for Electr. Eng. & Inf. Technol., Univ. of Paderborn, Paderborn, Germany
fYear :
2009
fDate :
14-18 Sept. 2009
Firstpage :
460
Lastpage :
463
Abstract :
This paper presents a single nanoparticle transistor using ZnO nanoparticles as the semiconductor material. The channel region was produced by spin-coating of a water-based ZnO dispersion onto a metal nanogap template. The device shows better performance compared to ZnO nanoparticle thin-film transistors, whereas no annealing above 200degC was performed. Hence, the integration technique is compatible to glass and foil substrates. I-V-measurements revealed the subthreshold swing of 290 mV/dec, the on/off current ratio of 5times103 and the carrier mobility of 0.05 cm2/Vs, which is the highest mobility of lowt-emperature solution-processed ZnO transistors reported to date. The operating voltages were below 5 V.
Keywords :
II-VI semiconductors; annealing; carrier mobility; field effect transistors; nanoparticles; spin coating; thin film transistors; zinc compounds; N-type single nanoparticle transistors; ZnO; annealing; carrier mobility; foil substrate; glass substrate; low temperature solution-processed transistors; metal nanogap template; nanoparticle thin-film transistors; semiconductor material; spin-coating; water-based dispersion; Annealing; Glass; Nanoparticles; Nanoscale devices; Semiconductor materials; Substrates; Temperature; Thin film transistors; Voltage; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 2009. ESSDERC '09. Proceedings of the European
Conference_Location :
Athens
ISSN :
1930-8876
Print_ISBN :
978-1-4244-4351-2
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2009.5331373
Filename :
5331373
Link To Document :
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