• DocumentCode
    2359984
  • Title

    Modeling the residual shrinkage during lithographic processing on flexible polymer substrates

  • Author

    Barink, M. ; Van den Berg, D. ; Yakimets, I. ; Meinders, E.

  • Author_Institution
    Holst Centre, TNO, Eindhoven, Netherlands
  • fYear
    2010
  • fDate
    26-28 April 2010
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    The challenge of lithographic production of electronic circuitry on polymer foil is that deformations approaching the feature sizes of the circuitry can cause considerable overlay problems and thereby malfunctioning of the devices. The substrate foil is susceptible to several types of deformations. Accurate prediction of these deformations is of great importance, as it will help to improve the production process and thereby improve the quality of the electronic devices. One of the deformations is the residual shrinkage, a deformation that occurs after application of a heat step to a polymer foil. This study presents an experimental investigation of residual shrinkage combined with a modeling approach in which the temperature dependent visco-elastic material properties of the foil are used. The model enables us to more accurately predict overlay errors.
  • Keywords
    lithography; polymer films; shrinkage; viscoelasticity; deformations; flexible polymer substrate; lithographic processing; polymer foil; residual shrinkage; visco-elastic material property; Circuits; Crystalline materials; Flat panel displays; Industrial electronics; Internal stresses; Lithography; Organic light emitting diodes; Plastics; Polymers; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE), 2010 11th International Conference on
  • Conference_Location
    Bordeaux
  • Print_ISBN
    978-1-4244-7026-6
  • Type

    conf

  • DOI
    10.1109/ESIME.2010.5464564
  • Filename
    5464564