Title :
Plasma beam alignment of liquid crystal with improved alignment stability [LCD manufacture]
Author :
Liu, P.-C. ; Lee, C.-Y. ; Hsiung, M.T. ; Lee, C.-D. ; Yaroshchuk, O.V. ; Kravchuk, R.M.
Author_Institution :
Industrial Technol. Res. Inst., Hsin-Chu, Taiwan
Abstract :
A method of plasma beam treatment providing liquid crystal (LC) aligning substrates of improved alignment stability is described. In this method the aligning substrates are obliquely treated with a plasma flux containing alignment and passivation agents simultaneously. This method is applicable for the substrates of organic and inorganic origin. During this treating process, good pretilt angle stability and alignment quality are much promised.
Keywords :
liquid crystal displays; liquid crystals; molecular orientation; passivation; plasma materials processing; surface treatment; alignment agents; alignment quality; alignment stability; cellular manufacturing; flat panel liquid crystal display; inorganic substrates; liquid crystal aligning substrates; organic substrates; passivation agents; plasma beam treatment; plasma flux; pretilt angle stability; Degradation; Hydrogen; Ion beams; Liquid crystal displays; Liquid crystals; Particle beams; Passivation; Plasma applications; Plasma stability; Substrates;
Conference_Titel :
Mechatronics, 2005. ICM '05. IEEE International Conference on
Print_ISBN :
0-7803-8998-0
DOI :
10.1109/ICMECH.2005.1529386
