• DocumentCode
    2360296
  • Title

    Development of high aspect ratio via filling process for 3D packaging application

  • Author

    Praveen, Sampath Kumar ; Tsan, Ho Wai ; Chua, Kenneth ; Lam, Trang ; Nagarajan, Ranganathan

  • Author_Institution
    Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
  • fYear
    2010
  • fDate
    8-10 Dec. 2010
  • Firstpage
    762
  • Lastpage
    764
  • Abstract
    This paper presents our development work to achieve high aspect ratio void-free polymer via filling with various types of organic materials for potential application in 3D wafer level packaging. This study focuses on the development of via filling process using the conventional spin-coating and curing process. Thermoplastic polymers have been selected for this evaluation due to its ability to reflow and fill gaps easily. Test wafers with circular via patterns with diameters from 1-70 μm with aspect ratios from 1-10 have been evaluated. The various challenges to achieving void-free via filling have been presented and it has been demonstrated that a void-free filling is feasible for vias with aspect ratio of 1-8.
  • Keywords
    curing; filling; polymers; spin coating; wafer level packaging; 3D wafer level packaging; curing process; filling process; high aspect ratio void-free polymer; organic material; size 1 micron to 10 micron; size 1 micron to 70 micron; spin-coating; thermoplastic polymer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference (EPTC), 2010 12th
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4244-8560-4
  • Electronic_ISBN
    978-1-4244-8561-1
  • Type

    conf

  • DOI
    10.1109/EPTC.2010.5702749
  • Filename
    5702749