DocumentCode :
2360601
Title :
Failure modes of Wafer Level Thin Film MEMS packages during wafer thinning
Author :
Zaal, J.J.M. ; van Driel, W.D. ; Zhang, G.Q.
Author_Institution :
Dept. PME, Delft Univ. of Technol., Delft, Netherlands
fYear :
2010
fDate :
26-28 April 2010
Firstpage :
1
Lastpage :
6
Abstract :
An increasing number of semiconductor companies have research programs related to MEMS resonators. This can be explained by the possible wide range of application areas. Many resonators operate in vacuum and sealing of the cavity can be obtained by using a Wafer Level Thin Film Package (WLTFP). To fit the MEMS-die into a small package it needs to be thinned. In this paper the effect of wafer thinning on the WLTFP is investigated by means of simulation and experiments. The effects of tape removal on WLTFP´s are simulated in 2 and 3 dimensions using the cohesive zones technique. Necessary adhesive properties of the grinding foil are measured by a grinding tape peeling experiment. In 2D FE simulations damage is included to predict the most likely cracking path.
Keywords :
adhesives; cavity resonators; finite element analysis; thin film devices; wafer level packaging; 2D FE simulations; MEMS resonators; cohesive zones technique; failure modes; grinding tape peeling; semiconductor companies; wafer level thin film MEMS packages; wafer thinning; Micromechanical devices; Packaging; Transistors; Wafer scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE), 2010 11th International Conference on
Conference_Location :
Bordeaux
Print_ISBN :
978-1-4244-7026-6
Type :
conf
DOI :
10.1109/ESIME.2010.5464595
Filename :
5464595
Link To Document :
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