DocumentCode :
2362249
Title :
Power transistor design guidelines and RF load-pull characterization of a 0.13-µm SOI CMOS technology
Author :
Carrara, F. ; Presti, C.D. ; Palmisano, G. ; Scuderi, A.
Author_Institution :
DIEES, Univ. di Catania, Catania, Italy
fYear :
2009
fDate :
14-18 Sept. 2009
Firstpage :
444
Lastpage :
447
Abstract :
In this work, the RF power performance of a 0.13-mum partially depleted SOI CMOS technology is explored. To this end, a prototype 1-mm-width power transistor has been designed and fabricated for multi-harmonic load-pull characterization. The device tolerance to single-transistor latch-up under large-signal conditions has been considered as the key design issue for safe operation in RF power applications. Proper design criteria have been derived and the length of the gate fingers has been chosen accordingly. The test device achieves a 72% power-added efficiency and a 19.5-dBm output power level, while operating at a 2-V supply voltage under 1.9-GHz continuous-wave excitation.
Keywords :
CMOS integrated circuits; power MOSFET; silicon-on-insulator; MOS transistors; RF load-pull characterization; SOI CMOS technology; continuous-wave excitation; device tolerance; frequency 1.9 GHz; power transistor design; power-added efficiency; silicon-on-insulator; single-transistor latch-up; size 0.13 mum; size 1 mm; transistor fabrication; voltage 2 V; CMOS technology; Guidelines; MOS devices; MOSFETs; Metal-insulator structures; Power transistors; Prototypes; Radio frequency; Substrates; Transformers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 2009. ESSDERC '09. Proceedings of the European
Conference_Location :
Athens
ISSN :
1930-8876
Print_ISBN :
978-1-4244-4351-2
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2009.5331546
Filename :
5331546
Link To Document :
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