• DocumentCode
    2362249
  • Title

    Power transistor design guidelines and RF load-pull characterization of a 0.13-µm SOI CMOS technology

  • Author

    Carrara, F. ; Presti, C.D. ; Palmisano, G. ; Scuderi, A.

  • Author_Institution
    DIEES, Univ. di Catania, Catania, Italy
  • fYear
    2009
  • fDate
    14-18 Sept. 2009
  • Firstpage
    444
  • Lastpage
    447
  • Abstract
    In this work, the RF power performance of a 0.13-mum partially depleted SOI CMOS technology is explored. To this end, a prototype 1-mm-width power transistor has been designed and fabricated for multi-harmonic load-pull characterization. The device tolerance to single-transistor latch-up under large-signal conditions has been considered as the key design issue for safe operation in RF power applications. Proper design criteria have been derived and the length of the gate fingers has been chosen accordingly. The test device achieves a 72% power-added efficiency and a 19.5-dBm output power level, while operating at a 2-V supply voltage under 1.9-GHz continuous-wave excitation.
  • Keywords
    CMOS integrated circuits; power MOSFET; silicon-on-insulator; MOS transistors; RF load-pull characterization; SOI CMOS technology; continuous-wave excitation; device tolerance; frequency 1.9 GHz; power transistor design; power-added efficiency; silicon-on-insulator; single-transistor latch-up; size 0.13 mum; size 1 mm; transistor fabrication; voltage 2 V; CMOS technology; Guidelines; MOS devices; MOSFETs; Metal-insulator structures; Power transistors; Prototypes; Radio frequency; Substrates; Transformers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 2009. ESSDERC '09. Proceedings of the European
  • Conference_Location
    Athens
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4244-4351-2
  • Electronic_ISBN
    1930-8876
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2009.5331546
  • Filename
    5331546