Title :
APMP key comparison for the 10 MΩ and 1 GΩ resistance
Author :
Kwang Min Yu ; Wan Seop Kim ; Kwon Soo Han ; Hsu, Jimmy Chun-Ming ; Jessadajin, Chiwat ; Ishak, Nirul Irwani ; Zhou Yinzhu ; Kaneko, Nobu-hisa ; Pritchard, Brian ; Matlejoane, Alexander ; Liang Bo ; Semenov, Yuri P. ; Lam, Brenda H. S. ; Termikhanov, Dana
Author_Institution :
Korea Res. Inst. of Stand. & Sci., Daejeon, South Korea
Abstract :
A key comparison for the 10 MΩ and 1 GΩ resistance, APMP.EM-K2, has been carried out by the Asia-Pacific Metrology Program(APMP) Regional Metrology Organization(RMO). The purpose is to establish the degree of equivalence of resistance among the national metrology institutes(NMIs) within APMP, in support of CIPM Mutual Recognition Agreement(MRA). The key comparison artifacts are three 10 MΩ and three 1 GΩ resistance standards which was loaned from NIST and the 13 NMIs were participated in the comparison. The results will be presented at the conference.
Keywords :
electric resistance measurement; APMP.EM-K2; Asia-Pacific Metrology Program; CIPM Mutual Recognition Agreement; MRA; NIST; NMI; National Metrology Institute; RMO; Regional Metrology Organization; resistance 1 Gohm; resistance 10 Mohm; resistance standard; Atmospheric measurements; Electrical resistance measurement; Metrology; Particle measurements; Resistance; Schedules; Standards; High resistance measurement techniques; High resistance standards; Key Comparison; measurement uncertainty;
Conference_Titel :
Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on
Conference_Location :
Rio de Janeiro
Print_ISBN :
978-1-4799-5205-2
DOI :
10.1109/CPEM.2014.6898378
