Title :
Metrology method for EVM based on waveform design
Author :
Zhou Feng ; Zhang Rui ; Rao Anlei ; Dan Mu ; Kai Cheng ; Gao You-gang
Author_Institution :
China Acad. of Telecommun. Res., MIIT, Beijing, China
Abstract :
In this paper, we mainly focus on the metrological issues of such error parameters as EVM (Error Vector Magnitude), and address technical solutions on: 1. periodical continuity of digital modulated baseband waveforms with finite length; 2. fundamental digital modulation error settings based on error symbol design. This system can be applied to calibrate VSA (vector signal analyzer), and simulations have shown that it can continuously adjust the values of digital modulation errors in a large range, and set the expected error parameters. In addition, it also shows strong consistency of the measured value and the calculated values for EVM.
Keywords :
calibration; error statistics; modulation; network analysers; waveform generators; EVM; VSA calibration; digital modulated baseband waveform; error symbol design; error vector magnitude; expected error parameter; fundamental digital modulation error; metrology method; periodical continuity; vector signal analyzer; Baseband; Calibration; Digital modulation; Metrology; Standards; Vectors; EVM; VSA; metrology; waveform;
Conference_Titel :
Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on
Conference_Location :
Rio de Janeiro
Print_ISBN :
978-1-4799-5205-2
DOI :
10.1109/CPEM.2014.6898398