DocumentCode
2363330
Title
Fast stability analysis of large-scale SRAM arrays and the impact of NBTI degradation
Author
Drapatz, Stefan ; Fischer, Thomas ; Hofmann, Klaus ; Amirante, Ettore ; Huber, Peter ; Ostermayr, Martin ; Georgakos, Georg ; Schmitt-Landsiedel, Doris
Author_Institution
Inst. for Tech. Electron., Tech. Univ. Munchen, Munich, Germany
fYear
2009
fDate
14-18 Sept. 2009
Firstpage
93
Lastpage
96
Abstract
This paper presents Read Margin analysis for large SRAM arrays with a fast test method that even can be realized in dual-VDD product chips. Classical Static Noise Margin (SNM) is mostly suitable for single-cell simulation. Read Margin (RM) measurement allows analysis of large arrays and correlates to SNM, but requires a dedicated test structure and long measurement time. The presented method analyzes the flipping of cells over varying supply voltage. The stability of large arrays can be characterized in read as well as in hold state depending on the state of the access transistors. Applying this method, the impact of Negative Bias Temperature Instability (NBTI) is demonstrated on both Read and Hold Margin in a 65 nm low power technology.
Keywords
SRAM chips; circuit simulation; integrated circuit noise; low-power electronics; thermal stability; NBTI degradation; classical static noise margin; fast stability analysis; large-scale SRAM arrays; low power technology; negative bias temperature instability; read margin analysis; read-and-hold margin; single-cell simulation; Degradation; Large-scale systems; Niobium compounds; Random access memory; Semiconductor device measurement; Stability analysis; Testing; Time measurement; Titanium compounds; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 2009. ESSDERC '09. Proceedings of the European
Conference_Location
Athens
ISSN
1930-8876
Print_ISBN
978-1-4244-4351-2
Electronic_ISBN
1930-8876
Type
conf
DOI
10.1109/ESSDERC.2009.5331600
Filename
5331600
Link To Document