DocumentCode
2363539
Title
Heterostructure barrier quantum well varactor
Author
Duez, V. ; Mélique, X. ; Havart, R. ; Podevin, F. ; Mounaix, P. ; Mollot, F. ; Vanbésien, O. ; Lippens, D.
Author_Institution
Inst. d´´Electron. et du Micro-Electron. du Nord, Univ. des Sci. et Tech. de Lille Flandres Artois, Villeneuve d´´Ascq, France
fYear
1998
fDate
3-4 Sep 1998
Firstpage
62
Lastpage
65
Abstract
In this paper, we report on recent developments in multiplier technology using heterostructure barrier varactors. From the epitaxial point of view, the originality stems from a new device configuration based on a quantum-well/barrier scheme. Test samples were fabricated either in GaAs or in InP technology and exhibit significant improvements in terms of capacitance ratio (in excess of 10:1) and capacitance nonlinearity. On the other hand, we discuss other competing technologies notably planar-doped heterostructure barrier varactors
Keywords
capacitance; frequency multipliers; gallium arsenide; indium compounds; quantum well devices; submillimetre wave diodes; varactors; GaAs; GaAs technology; InP; InP technology; capacitance nonlinearity; capacitance ratio; heterostructure barrier QW varactor; multiplier technology; planar-doped HBV; quantum well varactor; Doping; Electrons; Gallium arsenide; Indium phosphide; Linearity; Molecular beam epitaxial growth; Quantum capacitance; Submillimeter wave technology; Testing; Varactors;
fLanguage
English
Publisher
ieee
Conference_Titel
Terahertz Electronics Proceedings, 1998. THz Ninety Eight. 1998 IEEE Sixth International Conference on
Conference_Location
Leeds
Print_ISBN
0-7803-4903-2
Type
conf
DOI
10.1109/THZ.1998.731664
Filename
731664
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