Measurement of nanoscale surface patterns produced by two-beam laser interference lithography

Author

Pan, Haiyan ; Liu, Lanjiao ; Xu, Jia ; Xu, Hongmei ; Song, Zhengxun ; Weng, Zhankun ; Hu, Zhen ; Zhang, Jin ; Yue, Yong ; Li, Dayou ; Wang, Zuobin

Author_Institution

CNM & IJRCNB Centers, Changchun Univ. of Sci. & Technol., Changchun, China

fYear

2010

fDate

4-7 Aug. 2010

Firstpage

1754

Lastpage

1759

Abstract

This paper presents a method for the measurement of nanoscale surface patterns produced by two-beam laser interference lithography (LIL). In the work, the combination of the Hough fitting and the least-squares fitting was first used to fit the edges of the fringe patterns and measure the slopes and periods of them in computer simulation, and then it was also used to inspect the nanoscale surface patterns from a two-beam LIL process. The computer simulation and experimentation results have shown that the method has the advantages of both high resistance to noise and high accuracy of measurement.

Keywords

Hough transforms; edge detection; least squares approximations; light interferometry; lithography; measurement; micromechanical devices; production engineering computing; quality control; Hough fitting; fringe patterns; least-squares fitting; nanoscale surface pattern measurement; two-beam laser interference lithography; Fitting; Image edge detection; Noise; Noise measurement; Pixel; Speckle; Transforms;

fLanguage

English

Publisher

ieee

Conference_Titel

Mechatronics and Automation (ICMA), 2010 International Conference on

Conference_Location

Xi´an

ISSN

2152-7431

Print_ISBN

978-1-4244-5140-1

Electronic_ISBN

2152-7431

Type

conf

DOI

10.1109/ICMA.2010.5588724

Filename

5588724