• DocumentCode
    2364115
  • Title

    Physics and implications of minority carrier injection induced dopant deionization in bipolar transistor

  • Author

    Niu, Guofu ; Li, Zhen ; Luo, Lan ; Jingshan ; Xia, Kejun

  • Author_Institution
    Electr. & Comput. Eng. Dept., Auburn Univ., Auburn, AL, USA
  • fYear
    2011
  • fDate
    9-11 Oct. 2011
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We examine here the physics and implications of minority carrier injection induced dopant deionization in bipolar transistors. At low temperatures, the rate of such deionization with increasing bias is significant in the neutral base of SiGe HBTs doped at a level near Mott transition, and charge control based transit time equations need to be modified properly. The total charges associated with conduction band, integral of q(n - N+d), and the total charges associated with valence band, integral of q(p - N-a), replace the total electron and hole charges in transit time equations. Another consequence is that considerably less hole charge is induced by the injected electron charge in the neutral base, which has implications on both device analysis and compact modeling.
  • Keywords
    Ge-Si alloys; heterojunction bipolar transistors; metal-insulator transition; semiconductor device models; valence bands; HBT; Mott transition; SiGe; charge control based transit time equations; heterojunction bipolar transistors; minority carrier injection induced dopant deionization; Charge carrier processes; Equations; Ionization; Mathematical model; Neodymium; Physics; Semiconductor process modeling; SiGe HBT; continuity equations; incomplete ionization; transit time;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2011 IEEE
  • Conference_Location
    Atlanta, GA
  • ISSN
    1088-9299
  • Print_ISBN
    978-1-61284-165-6
  • Type

    conf

  • DOI
    10.1109/BCTM.2011.6082736
  • Filename
    6082736