DocumentCode
2364115
Title
Physics and implications of minority carrier injection induced dopant deionization in bipolar transistor
Author
Niu, Guofu ; Li, Zhen ; Luo, Lan ; Jingshan ; Xia, Kejun
Author_Institution
Electr. & Comput. Eng. Dept., Auburn Univ., Auburn, AL, USA
fYear
2011
fDate
9-11 Oct. 2011
Firstpage
1
Lastpage
4
Abstract
We examine here the physics and implications of minority carrier injection induced dopant deionization in bipolar transistors. At low temperatures, the rate of such deionization with increasing bias is significant in the neutral base of SiGe HBTs doped at a level near Mott transition, and charge control based transit time equations need to be modified properly. The total charges associated with conduction band, integral of q(n - N+d), and the total charges associated with valence band, integral of q(p - N-a), replace the total electron and hole charges in transit time equations. Another consequence is that considerably less hole charge is induced by the injected electron charge in the neutral base, which has implications on both device analysis and compact modeling.
Keywords
Ge-Si alloys; heterojunction bipolar transistors; metal-insulator transition; semiconductor device models; valence bands; HBT; Mott transition; SiGe; charge control based transit time equations; heterojunction bipolar transistors; minority carrier injection induced dopant deionization; Charge carrier processes; Equations; Ionization; Mathematical model; Neodymium; Physics; Semiconductor process modeling; SiGe HBT; continuity equations; incomplete ionization; transit time;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2011 IEEE
Conference_Location
Atlanta, GA
ISSN
1088-9299
Print_ISBN
978-1-61284-165-6
Type
conf
DOI
10.1109/BCTM.2011.6082736
Filename
6082736
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