Title :
Physics and implications of minority carrier injection induced dopant deionization in bipolar transistor
Author :
Niu, Guofu ; Li, Zhen ; Luo, Lan ; Jingshan ; Xia, Kejun
Author_Institution :
Electr. & Comput. Eng. Dept., Auburn Univ., Auburn, AL, USA
Abstract :
We examine here the physics and implications of minority carrier injection induced dopant deionization in bipolar transistors. At low temperatures, the rate of such deionization with increasing bias is significant in the neutral base of SiGe HBTs doped at a level near Mott transition, and charge control based transit time equations need to be modified properly. The total charges associated with conduction band, integral of q(n - N+d), and the total charges associated with valence band, integral of q(p - N-a), replace the total electron and hole charges in transit time equations. Another consequence is that considerably less hole charge is induced by the injected electron charge in the neutral base, which has implications on both device analysis and compact modeling.
Keywords :
Ge-Si alloys; heterojunction bipolar transistors; metal-insulator transition; semiconductor device models; valence bands; HBT; Mott transition; SiGe; charge control based transit time equations; heterojunction bipolar transistors; minority carrier injection induced dopant deionization; Charge carrier processes; Equations; Ionization; Mathematical model; Neodymium; Physics; Semiconductor process modeling; SiGe HBT; continuity equations; incomplete ionization; transit time;
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2011 IEEE
Conference_Location :
Atlanta, GA
Print_ISBN :
978-1-61284-165-6
DOI :
10.1109/BCTM.2011.6082736