Title :
The EMRP project GraphOhm - Towards quantum resistance metrology based on graphene
Author :
Ahlers, F. ; Kucera, J. ; Poirier, W. ; Jeanneret, Blaise ; Satrapinski, A. ; Tzalenchuk, A. ; Vrabcek, P. ; Bergsten, Tobias ; Hwang, Chang-Sing ; Yakimova, R. ; Kubatkin, S.
Author_Institution :
Phys.-Tech. Bundesanstalt (PTB), Braunschweig, Germany
Abstract :
A new joint research project (JRP) integrating metrology institutes and universities from nine countries is aimed at realization of a new generation of standards for quantum resistance metrology. The project exploits graphene´s properties to simplify operation of standards without compromising the unprecedented precision delivered by semiconductor quantum Hall devices. Higher operating temperatures (above 4.2 K, and up to 8 K) and together with lower magnetic fields (below 5 T, and potentially down to 2 T) will lead to a significantly improved and cost-saving dissemination of intrinsically referenced resistance standards to all end-users relying on electrical measurements.
Keywords :
Hall effect devices; electric resistance measurement; graphene; measurement standards; C; EMRP project GraphOhm; JRP; electrical measurement; graphene; intrinsically referenced resistance standard dissemination; joint research project; quantum resistance metrology standard; semiconductor quantum Hall device; Calibration; Electrical resistance measurement; Graphene; Materials; Metrology; Resistance; Standards; Measurement standards; graphene; quantum hall effect; resistance;
Conference_Titel :
Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on
Conference_Location :
Rio de Janeiro
Print_ISBN :
978-1-4799-5205-2
DOI :
10.1109/CPEM.2014.6898502