DocumentCode
2365190
Title
Effective photoluminescence modification of ZnO nanocombs by plasma immersion ion implantation
Author
Yang, Y. ; Tay, B.K. ; Sun, X.W. ; Han, Z.J. ; Shen, Z.X. ; Lincoln, C. ; Smith, T.
Author_Institution
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
fYear
2008
fDate
24-27 March 2008
Firstpage
20
Lastpage
24
Abstract
Surface defects passivation of ZnO nanocombs was performed through a Ti plasma immersion ion implantation (PIII) with low bias voltages ranging from 0-10 kV. The room temperature near-band-edge emission was enhanced for modified ZnO nanostructures while the defect-related green band was completely quenched. Detailed temperature dependence PL revealed that the deep-level emissions were surface related and it was the most affected recombination processes by PHI, whereas the surface exciton related emission was slowly quenched as the ion energy increased. Time-resolved PL shows that the lifetime of the UV emission has been enhanced whereas the long lifetime of visible emission of the untreated ZnO nanocombs has been largely shortened. Our work demonstrates that metal ion PIII can be an effective way for surface modification/passivation of ZnO nanostructures to improve the optical properties.
Keywords
II-VI semiconductors; deep levels; excitons; nanostructured materials; passivation; photoluminescence; plasma immersion ion implantation; radiation quenching; semiconductor doping; titanium; wide band gap semiconductors; zinc compounds; PIII; UV emission; ZnO:Ti; deep-level emissions; nanocombs; nanostructures; near-band-edge emission; photoluminescence; plasma immersion ion implantation; quenching; recombination; room temperature; surface defect passivation; surface exciton; temperature 293 K to 298 K; visible emission; voltage 0 kV to 10 kV; Excitons; Low voltage; Nanostructures; Particle beam optics; Passivation; Photoluminescence; Plasma immersion ion implantation; Plasma temperature; Temperature dependence; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
Conference_Location
Shanghai
Print_ISBN
978-1-4244-1572-4
Electronic_ISBN
978-1-4244-1573-1
Type
conf
DOI
10.1109/INEC.2008.4585429
Filename
4585429
Link To Document