DocumentCode :
2365190
Title :
Effective photoluminescence modification of ZnO nanocombs by plasma immersion ion implantation
Author :
Yang, Y. ; Tay, B.K. ; Sun, X.W. ; Han, Z.J. ; Shen, Z.X. ; Lincoln, C. ; Smith, T.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
fYear :
2008
fDate :
24-27 March 2008
Firstpage :
20
Lastpage :
24
Abstract :
Surface defects passivation of ZnO nanocombs was performed through a Ti plasma immersion ion implantation (PIII) with low bias voltages ranging from 0-10 kV. The room temperature near-band-edge emission was enhanced for modified ZnO nanostructures while the defect-related green band was completely quenched. Detailed temperature dependence PL revealed that the deep-level emissions were surface related and it was the most affected recombination processes by PHI, whereas the surface exciton related emission was slowly quenched as the ion energy increased. Time-resolved PL shows that the lifetime of the UV emission has been enhanced whereas the long lifetime of visible emission of the untreated ZnO nanocombs has been largely shortened. Our work demonstrates that metal ion PIII can be an effective way for surface modification/passivation of ZnO nanostructures to improve the optical properties.
Keywords :
II-VI semiconductors; deep levels; excitons; nanostructured materials; passivation; photoluminescence; plasma immersion ion implantation; radiation quenching; semiconductor doping; titanium; wide band gap semiconductors; zinc compounds; PIII; UV emission; ZnO:Ti; deep-level emissions; nanocombs; nanostructures; near-band-edge emission; photoluminescence; plasma immersion ion implantation; quenching; recombination; room temperature; surface defect passivation; surface exciton; temperature 293 K to 298 K; visible emission; voltage 0 kV to 10 kV; Excitons; Low voltage; Nanostructures; Particle beam optics; Passivation; Photoluminescence; Plasma immersion ion implantation; Plasma temperature; Temperature dependence; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1572-4
Electronic_ISBN :
978-1-4244-1573-1
Type :
conf
DOI :
10.1109/INEC.2008.4585429
Filename :
4585429
Link To Document :
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