DocumentCode :
2366124
Title :
Variation-Aware Macromodeling and Synthesis of Analog Circuits Using Spline Center and Range Method and Dynamically Reduced Design Space
Author :
Basu, Shubhankar ; Kommineni, Balaji ; Vemuri, Ranga
Author_Institution :
Electr. & Comput. Eng., Univ. of Cincinnati Cincinnati, Cincinnati, OH
fYear :
2009
fDate :
5-9 Jan. 2009
Firstpage :
433
Lastpage :
438
Abstract :
Manufacturing and process irregularities in nanometer technologies can degrade yield and severely slow down the design cycle time. Process variation aware methodologies can help in yield improvement and meeting time-to-market requirements for system-on-chip designs. Analog circuits are extremely sensitive to device mismatches and exhibit non-linear variations in their performance under the influence of manufacturing irregularities. Performance variation in blocks can lead to degraded system performance. In this work, we present a variation-aware performance macromodeling technique for analog building blocks that is fast and accurate and guarantees convergence during synthesis. The improvements in accuracy and time complexity of the macromodel generation process is achieved by constructing a target design region graph and dynamic reduction of the design space. The target design region also helps in reducing time during re-synthesis and achieving faster convergence. Experimental results demonstrate the accuracy of the macromodels and the reduction in synthesis time compared to spice based simulation-in-the-loop evaluations and static and adaptive sampling based techniques.
Keywords :
analogue integrated circuits; integrated circuit design; integrated circuit modelling; splines (mathematics); analog building blocks; analog circuits; dynamically reduced design space; macromodel generation process; range method; spline center; target design region graph; variation-aware macromodeling; Analog circuits; Circuit synthesis; Convergence; Degradation; Manufacturing processes; Space technology; Spline; System performance; System-on-a-chip; Time to market; Analog; Macromodel; Process Variation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Design, 2009 22nd International Conference on
Conference_Location :
New Delhi
ISSN :
1063-9667
Print_ISBN :
978-0-7695-3506-7
Type :
conf
DOI :
10.1109/VLSI.Design.2009.51
Filename :
4749711
Link To Document :
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