Title :
Photodefinable High-k SU8 Nanocomposite for Embedded Capacitors
Author :
Xu, Jianwen ; Wong, C.P.
Author_Institution :
Sch. of Mater. Sci. & Eng., Georgia Inst. of Technol., Atlanta, GA
Abstract :
A novel, photodefinable, high dielectric constant (high-k) nanocomposite material has been developed for embedded capacitor applications. It consists of SU8 as the polymer matrix and barium titanate (BT) nanoparticles as the tiller. The UV absorption characteristics of BT nanoparticles were studied with a UV-Vis spectrophotometer. The effects of BT nanoparticle size, filler loading, and UV irradiation dose on SU8 photopolymerization were systematically investigated. The dielectric properties of the photodefined SU8 nanocomposites were characterized. Embedded capacitors using the novel high dielectric constant SU8 composite photoresist were demonstrated on a flexible polyimide substrate by UV lithography method
Keywords :
barium compounds; capacitors; dielectric materials; nanocomposites; nanoparticles; photoresists; polymers; spectrophotometers; ultraviolet lithography; ultraviolet spectra; SU8 photopolymerization; UV lithography; barium titanate nanoparticles; dielectric constant; embedded capacitors; nanocomposite materials; polymer matrix; Barium; Capacitors; Dielectric substrates; Electromagnetic wave absorption; High K dielectric materials; High-K gate dielectrics; Nanoparticles; Nanostructured materials; Polymers; Titanium compounds;
Conference_Titel :
Advanced Packaging Materials: Processes, Properties and Interface, 200611th International Symposium on
Conference_Location :
Atlanta, GA
Print_ISBN :
1-4244-0260-3
DOI :
10.1109/ISAPM.2006.1666022
