DocumentCode
2366572
Title
Infrastructures for Education, Research and Industry in Microelectronics A Look Worldwide and a Look at India
Author
Courtois, B. ; Torki, Kholdoun ; Dumont, S. ; Eyraud, S. ; Paillotin, J.-F. ; Pendina, G. Di
Author_Institution
CMP, Grenoble
fYear
2009
fDate
5-9 Jan. 2009
Firstpage
561
Lastpage
566
Abstract
Infrastructures to provide access to custom integrated hardware manufacturing facilities are important because they allow students and researchers to access professional facilities at a reasonable cost, and they allow companies to access small volume production, otherwise difficult to obtain directly from manufacturers. This paper is reviewing the most recent developments at CMP like the introduction of a CMOS 45 nm process, the cooperation between the major infrastructures services available worldwide and recent developments w.r.t. India. The conclusion is addressing technical developments as well as considerations like globalization and excellence.
Keywords
CMOS integrated circuits; electronic engineering education; integrated circuit manufacture; nanoelectronics; production facilities; professional aspects; research and development; CMOS process; CMP; India; custom integrated hardware manufacturing facilities; education; infrastructures services; microelectronics; professional facilities; research and development; size 45 nm; small-volume production; technical developments; BiCMOS integrated circuits; CMOS process; Costs; Gallium arsenide; Germanium silicon alloys; MOS devices; Manufacturing industries; Microelectronics; Micromechanical devices; Silicon germanium; infrastructures; integrated circuits; multi-projects wafers;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Design, 2009 22nd International Conference on
Conference_Location
New Delhi
ISSN
1063-9667
Print_ISBN
978-0-7695-3506-7
Type
conf
DOI
10.1109/VLSI.Design.2009.17
Filename
4749731
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