Title :
4500 V IEGTs having switching characteristics superior to GTO
Author :
Kitagawa, Mitsuhiko ; Nakagawa, Akio ; Matsushita, Ken Ichi ; Hasegawa, Shigeru ; Inoue, Tomoki ; Yahata, Akihiro ; Takenaka, Hiroshi
Author_Institution :
Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
Abstract :
In this paper, the authors report, for the first time, an exact prediction of the turn-off characteristics of 4500 V IEGTs and compare the results with those for GTOs. The prediction was made by means of device simulation and trial fabrication of IEGTs. The turn-off power loss of the 4500 V IEGT with a 17 μm deep trench gate is predicted to be less than that of the 4500 V GTO-thyristor. It was found that the IEGTs with 4 μm deep and wide trench gate can attain a small on-state voltage drop, which is the same level as that of the IEGT with 17 μm deep and narrow trench gate. The on-state voltage drop of the fabricated IEGT with the 4 μm deep trench gate is 4.5 V at 50 A/cm2. Although the device design of the fabricated IEGT was not optimized, the observed turn-off characteristics were in good agreement with the simulated results. It has been numerically confirmed that the 4500 V IEGT can realize a smaller turn-off loss than a 4500 V GTO-thyristor under a typical application circuit. It was, thus, confirmed that IEGTs can replace GTOs without degradation of switching frequency
Keywords :
field effect transistor switches; losses; power MOSFET; power field effect transistors; power semiconductor switches; semiconductor device models; 17 micron; 4 micron; 4.5 V; 4500 V; IEGTs; device simulation; injection enhanced gate transistors; on-state voltage drop; power loss; switching characteristics; switching frequency; trench gate; turn-off characteristics; turn-off loss; Analytical models; Anodes; Charge carrier lifetime; Circuit simulation; Current density; Electric variables; Power system simulation; Predictive models; Research and development; Voltage;
Conference_Titel :
Power Semiconductor Devices and ICs, 1995. ISPSD '95., Proceedings of the 7th International Symposium on
Conference_Location :
Yokohama
Print_ISBN :
0-7803-2618-0
DOI :
10.1109/ISPSD.1995.515086