• DocumentCode
    2367137
  • Title

    Electrical and optical properties of In2O3 nanoparticles prepared by MOCVD

  • Author

    Wang, Ch.Y. ; Cimalla, V. ; Kups, Th. ; Ambacher, O. ; Himmerlich, M. ; Krischok, S.

  • Author_Institution
    Fraunhofer-Inst. for Appl. Solid State Phys., Freiburg
  • fYear
    2008
  • fDate
    24-27 March 2008
  • Firstpage
    489
  • Lastpage
    492
  • Abstract
    High sensitive ozone sensors working at room temperature were demonstrated based on In2O3 nanoparticles, which were deposited by metal organic chemical vapor deposition (MOCVD). The resistance of the In2O3 particle containing layer can be tuned over five orders of magnitude after ultraviolet light illumination and oxidation by ozone containing gases. To investigate the light induced effect on In2O3 layer, In2O3 nanoparticles were deposited at different substrate temperatures by MOCVD and the electrical and optical properties of the layers were analyzed. It was found that the layers deposited above 220degC showed a typical linear IN behavior while the layers grown below 220degC revealed a classical Schottky behavior. Furthermore, the In2O3 layers deposited below the critical temperature demonstrated not only an increasing absorption at 3.7 eV, which is the optical band gap of In2O3 thin films, but also two additional absorption peaks located at ~43 and ~5.3 eV, respectively. These differences in structural, electrical and optical properties of In2O3 layers lead to different ozone sensing properties.
  • Keywords
    MOCVD; electrical conductivity; indium compounds; nanoparticles; ultraviolet radiation effects; In2O3; MOCVD; metal organic chemical vapor deposition; nanoparticles; temperature 293 K to 298 K; Absorption; Chemical sensors; Chemical vapor deposition; Electric resistance; MOCVD; Nanoparticles; Optical films; Optical sensors; Organic chemicals; Temperature sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-1572-4
  • Electronic_ISBN
    978-1-4244-1573-1
  • Type

    conf

  • DOI
    10.1109/INEC.2008.4585534
  • Filename
    4585534